Developer Spinner CEE1

Type: Photolithography

Description: Used to apply developer while the wafer if spinning. Capable of spin speeds up to 12,000 rpm, and acceleration up to 30,000 rpm/s. Developer used is CD26.

Substrate Compatibility: Varying sizes allowed, from pieces as small as 5mm, all the way up to 8 inch wafers.

Location: Keller-Bay 2

Badger Name: K2 Developer CEE1

Training: Review SOP prior to requesting training.