FEI Helios NanoLab G4 dual-beam focused ion beam


  • Installed in the vibrationally isolated High Resolution Microscopy Center (HRMC).
  • Provides fast, accurate, and precise milling and deposition of complex structures with critical dimensions of less than 10 nm.
  • Ultimate SEM imaging resolution approaches 0.6 nm.

More detailed information is available at the vendor web site: www.fei.com/products/dualbeam/helios-nanolab/