New Tool at the Nano Center

The Nano Center recently added a high power plasma cleaner to its lithography tool set. The Harrick Plasma, Inc. Plasma Cleaner is a benchtop unit with adjustable RF power setting that uses oxygen and/or Argon
plasma to chemically etch surface organic contaminants with highly reactive free radicals or activate surfaces to alter surface characteristics such as wetting or adhesion.

The Nano Center is always adding new tools to provide our users with the most advanced facilities possible!