E-Beam Spinner-CEE1 and CEE2
Description: Used for applying E-beam resists and imprint resists uniformly on a substrate. Spin speed, length, acceleration, and exhaust rate can be altered to achieve desired resist thickness. Capable of spin speeds up to 10,000 rpm, and acceleration up to 30,000 rpm/s.
Substrate Compatibility: Varying sizes allowed, from pieces as small as 5mm, all the way up to 6 inch wafers.
Location: PAN-Bay 5
Badger Name: P5 Ebeam Spinner CEE1 and P5 Ebeam Spinner CEE2
Training: A general E-Beam short course will include training on this tool. Review SOP prior to requesting training.