Vistec E-Beam

Type: Nanolithography

Description: 100 KeV electron beam lithography system. Capable of making sub 10 nm lines.

Substrate Compatibility: Varying sizes allowed, from pieces, all the way up to 4 inch wafers.

Location: PAN-Bay 5

Badger Name: P5 Ebeam Litho EBPG5000+ Vistec

Supplemental Material: Cygwin SoftwareWiki

Training: A general E-Beam short course will include training on this tool. Review the SOP prior to requesting training.