Description: The electron beam evaporator is used to evaporate solid dielectrics (granules, no powders) onto substrates. Evaporation is done under a high vacuum in a water cooled bell jar chamber. Evaporation is achieved by heating a source with an electron beam. As the source material evaporates, it forms a thin film on the samples. Also has GLAD deposition capability.
Films: Al2O3, SiO2
Substrate Compatibility: 4 inch wafers only. Pieces can be used if placed on a 4 inch carrier wafer.
Location: Keller-Bay 3
Badger Name: K3 Evaporator Varian
Training: Review the SOP prior to requesting training.