Description: This is a system designed to expose samples to xenon di-fluoride (XeF2) gas in a cyclic or pulsed mode. XeF2 can be used to isotropically etch Si, Mo, Ge, Nb, polysilicon, Ti, and W.
Substrate Compatibility: Varying sizes allowed, from pieces, all the way up to 4 inch wafers.
Location: Keller-Bay 3
Badger Name: K3 Etcher