Description: The electron beam evaporator is used to deposit thin films onto substrates. Evaporation is done under a high vacuum in a bell jar chamber. Evaporation is achieved by heating a source with an electron beam. As the source material evaporates, it forms a thin film on the samples.
Films: Al, Ag, Au, Co, Cr, Cu, Ge, Mn, Mo, Ni, Sn, Ti
Substrate Compatibility: 4 inch wafers only. Pieces can be used if placed on a 4 inch carrier wafer.
Location: Keller-Bay 3
Badger Name: K3 Evaporator Temescal