Temescal Evaporator

Type: Deposition-PVD

Description: The electron beam evaporator is used to deposit thin films onto substrates. Evaporation is done under a high vacuum in a bell jar chamber. Evaporation is achieved by heating a source with an electron beam. As the source material evaporates, it forms a thin film on the samples.

Films: Al, Ag, Au, Co, Cr, Cu, Ge, Mn, Mo, Ni, Sn, Ti

Substrate Compatibility: 4 inch wafers only. Pieces can be used if placed on a 4 inch carrier wafer.

Location: Keller-Bay 3

Badger Name: K3 Evaporator Temescal

Training: Review the SOP prior to requesting training.