AJA2 Sputterer - PAN
Type: Deposition-PVD
Description: The AJA sputter system utilizes ionized gas (Ar, O2, N2) to sputter metal material from source targets to substrates, depositing a thin film in the process. There are 6 shuttered guns on the system: 3 DC, and 3 RF.
Films: Al, Au, Cu, SiO2, Ti, Ti:W
Substrate Compatibility: 4 inch wafers only. Pieces can be used if placed on a 4 inch carrier wafer.
Location: PAN-Bay 3
Badger Name: P3 Sputterer AJA2
Training: Review the SOP prior to requesting training.
