HD PCVD (High Density Plasma Enhanced Chemical Vapor Deposition)-Plasmatherm

Type: Deposition-CVD

Description: The Apex SLR ICP is a high density plasma enhanced chemical vapor deposition system with an inductively coupled plasma configuration.

Films: Silicon nitride, Silicon dioxide, Diamond-like carbon, and Amorphous silicon.

Substrate Compatibility: 4 inch wafers only. Pieces can be used if placed on a 4 inch carrier wafer.

Location: PAN-Bay 3

Badger Name: P3 HD PCVD Plasmatherm

Training: Review SOP prior to requesting training.