HD PCVD (High Density Plasma Enhanced Chemical Vapor Deposition)-Plasmatherm
Type: Deposition-CVD
Description: The Apex SLR ICP is a high density plasma enhanced chemical vapor deposition system with an inductively coupled plasma configuration.
Films: Silicon nitride, Silicon dioxide, Diamond-like carbon, and Amorphous silicon.
Substrate Compatibility: 4 inch wafers only. Pieces can be used if placed on a 4 inch carrier wafer.
Location: PAN-Bay 3
Badger Name: P3 HD PCVD Plasmatherm
Training: Review SOP prior to requesting training.
