Headway Spinner
Type: Photolithography
Description: Used for applying photoresist uniformly on a substrate. Capable of spin speeds up to 6,000 rpm and manual acceleration. Compatible with all photoresists.
Substrate Compatibility: Varying sizes allowed, from pieces as small as 5mm, all the way up to 6 inch wafers.
Location: Keller-Bay 2
Badger Name: K2 Spinner Headway
Training: A general photolithography short course will include training on this tool. Review SOP prior to requesting training.
