Contact Aligner MaBa6-Keller
Type: Photolithography
Description: Used for optical photolithography. Ideal for exposing broadband positive and negative resists. Limited to feature size of 1 µm or greater. Front side alignment and back side alignment capabilities.
Substrate Compatibility: Varying sizes allowed, from pieces, all the way up to 6 inch wafers.
Location: Keller-Bay 2
Badger Name: K2 Aligner Suss MABA6
Supplemental Material: Photoresists
Training: A general photolithography short course will include training on this tool. Review the SOP prior to requesting training.
