Spinner CEE2-PAN

Type: Photolithography

Description: Used for applying photoresist uniformly on a substrate. Capable of spin speeds up to 12,000 rpm, and acceleration up to 30,000 rpm/s. Compatible with most positive and some negative photoresists. No SU8, PDMS, PMMA, or E-Beam resists allowed.

Substrate Compatibility: Varying sizes allowed, from pieces as small as 5mm, all the way up to 6 inch wafers.

Location: PAN-Bay 4

Badger Name: P4 Spinner CEE2

Training: A general photolithography short course will include training on this tool. Review SOP prior to requesting training.