Contact Aligner Ma6-PAN

Type: Photolithography

Description: Used for optical photolithography. Ideal for exposing broadband positive and negative resists. Limited to feature size of 1 µm or greater. Front side alignment capabilities.

Substrate Compatibility: Varying sizes allowed, from pieces, all the way up to 6 inch wafers.

Location: PAN-Bay 4

Badger Name: P4 Aligner Suss MA6

Supplemental Material: Photoresists

Training: A general photolithography short course will include training on this tool. Review the SOP prior to requesting training.