Laserwriter-Heidelberg DWL200

Type: Photolithography

Description: This system can be used for either mask making or direct write on substrates. Minimum feature size is 1.5 µm for line or space for the 5mm write head and 1.0µm line or space with 2mm write head.

Substrate Compatibility: Varying sizes allowed, from pieces as small as 1"x1", up to 9"x9" photomasks.

Location: PAN-Bay 4

Badger Name: P4 Laserwriter Heildelberg DWL200

Supplemental Material: Mask Making Design RulesMask Design Submission Form

Training: Review the SOP prior to requesting training.