Oriel-Flood Exposure
Type: Photolithography
Description: Flood exposure system that produces a uniform beam of UV light. Ideal for exposure of photoresists during image reversal techniques.
Substrate Compatibility: Varying sizes allowed, from pieces, all the way up to 6 inch wafers.
Location: Keller-Bay 3
Badger Name: K3 Flood Expose Oriel
Training: Review SOP prior to requesting training.
