Type: Characterization

Description: A non-destructive method of measuring the index of refraction and film thickness of a dielectric film on a reflecting substrate. Can measure film thickness as low as a few Å and up to 3 µm.

Substrate Compatibility: Varying sizes allowed, from pieces, all the way up to 6 inch wafers.

Location: PAN-Hallway

Badger Name: P1 Ellipsometer Rudolph

Training: Review SOP prior to requesting training.